PARIS — STMicroelectronics NV announced it has joined Imagine, a CEA-Leti program focused on electron-beam direct write lithography for IC manufacturing for 22-nm and beyond. Intended to operate for ...
Nanoscale lithographic technologies have been intensively studied for the development of the next generation of semiconductor manufacturing practices. While mask-less/direct-write electron beam (EB) ...
Two major semiconductor players have unwrapped plans to ramp up production in the 0.13-µm (130-nm) CMOS process. Combining innovations in copper wiring, silicon-on-insulator (SOI) transistors, and ...
A Grenoble, France-based research team at CEA Leti and chip maker STMicroelectronics say that they have demonstrated the first hybrid III-V/silicon laser to be fabricated using a wafer manufacturing ...
SANTA CLARA, Calif. and HSINCHU, Taiwan, Oct. 08, 2025 (GLOBE NEWSWIRE) -- Following the launch of its Japan sales operation earlier this year and with fresh funding from global investors, Multibeam ...
Silicon photonics uses existing CMOS manufacturing infrastructure and techniques but lacks mature models that take into account known CMOS process variations and their effect on photonic component ...
SAN FRANCISCO — At this week's International Electron Devices Meeting (IEDM) here, IBM, Intel, TSMC and the NEC/Toshiba duo will separately present papers on 32-nm processes with high-k and metal ...
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