To use electron or ion beams to create nano-patterns the three methods that are typically used include ion beam milling, beam induced chemistry (deposition and etch), and beam induced lithography.

One of the greatest challenges in designing electronics is drawing very fine details. You normally need lithography, which complicates the process by requiring masks. However, Oak Ridge National ...

(Nanowerk News) Researchers from AMOLF s 3D-Photovoltaics group have successfully used an atomic force microscope to electrochemically print at the nanoscale. This technique can print structures for a ...

Genetically encoded probes to manipulate membrane potential by light have created radically new opportunities for the analysis of neuronal circuit structure and function. Through the intersection ...